Welcome to the Center for Nanolithography Research at the Rochester Institute of Technology
Research presented here has been carried out by students in the College of Engineering and College of Science under the direction of Dr. Bruce W. Smith and with support from the Semiconductor Research Corporation (SRC), DARPA/AFRL, International SEMATECH, ASML, Finle KLA/Tencor, Exitech, Intel, IBM and others.
Recent Papers
- On the Quality of Measured Optical Aberration Coefficients Using Phase Wheel Monitor
- Mask Enhancement Using an Evanescent Wave Effect
- Snell or Fresnel - The Influence of Material Index on Hyper NA Lithography
- Immersion Lithography with Numerical Apertures Above 2.0 Using High Index Optical Materials
From left to right: Peng Xie, Andrew Estroff, Jianming Zhou, Neal Lafferty, Bruce Smith, Bob Frankel, Lena Zavyalova, Anatoly Bourov, Meng Zhao
